标题: High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO2/ZrO2 Insulators
作者: Lin, S. H.
Chiang, K. C.
Chin, Albert
Yeh, F. S.
电子工程学系及电子研究所
Department of Electronics Engineering and Institute of Electronics
关键字: high kappa;metal-insulator-metal (MIM);TiO2;ZrO2
公开日期: 1-七月-2009
摘要: We have fabricated high-kappa Ni/TiO2/ZrO2/TiN metal-insulator-metal (MIM) capacitors. A low leakage current of 8 x 10(-8) A/cm(2) at 125 degrees C was obtained with a high 38-fF/mu m(2) capacitance density and better than the ZrO2 MIM capacitors. The excellent device performance is due to the lower electric field in 9.5-nm-thick TiO2/ZrO2 devices to decrease the leakage current and to a higher kappa value of 58 for TiO2 as compared with that of ZrO2 to preserve the high capacitance density.
URI: http://dx.doi.org/10.1109/LED.2009.2022775
http://hdl.handle.net/11536/149799
ISSN: 0741-3106
DOI: 10.1109/LED.2009.2022775
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 30
起始页: 715
结束页: 717
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