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dc.contributor.authorWen, Hua-Chiangen_US
dc.contributor.authorYang, Chu-Shouen_US
dc.contributor.authorChou, Wu-Chingen_US
dc.date.accessioned2019-04-02T05:58:54Z-
dc.date.available2019-04-02T05:58:54Z-
dc.date.issued2010-01-15en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2009.09.059en_US
dc.identifier.urihttp://hdl.handle.net/11536/149879-
dc.description.abstractWe present a study of the nanoindentation behavior of Zn1-xCdxSe epilayers grown using molecular beam epitaxy; the surface roughness, microstructure, and crystallinity were analyzed using atomic force microscopy, cross-sectional transmission electron microscopy, and X-ray diffraction; the hardness H and elastic modulus E were studied using nanoindentation techniques. We found that these highly crystalline materials possessed no stacking faults or twins in their microstructures. We observed a very marked increase in the value of H and a significant decrease in the value of E upon increasing the concentration of Cd, presumably because of an increase in the stiffness of the CdSe bond relative to that of the ZnSe bond. We observed a corresponding shrinkage of the contact-induced damage area for those films having a small grain size and a higher value of H. It appears that resistance against contact-induced damage requires a higher Cd concentration. (C) 2009 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectNanoindentationen_US
dc.subjectZnCdSeen_US
dc.subjectXTEMen_US
dc.subjectHardnessen_US
dc.titleEffect of microstructure on the nanomechanical properties of Zn1-xCdxSe alloysen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.apsusc.2009.09.059en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume256en_US
dc.citation.spage2128en_US
dc.citation.epage2131en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000273669300029en_US
dc.citation.woscount17en_US
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