標題: Higher-kappa titanium dioxide incorporating LaAlO3 as dielectrics for MIM capacitors
作者: Cheng, C. H.
Hsu, H. H.
Chen, P. C.
Liou, B. H.
Chin, Albert
Yeh, F. S.
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Metal-insulator-metal capacitor;LaAlO3;Al2O3
公開日期: 1-六月-2010
摘要: In this work, we studied a TiO2 mixed LaAlO3 dielectric (TLAO) for metal-insulator-metal (MIM) capacitors. The resulting capacitor characteristics showed a high capacitance density of 23.2 fF/mu m(2) and a low leakage current of 7.5 x 10(-7) A/cm(2) at -1 V. Comparing to the control samples of TiLaO (ILO), TLAO dielectrics with Al2O3 doping showed lower leakage current, smaller voltage nonlinearity and better time-dependent dielectric breakdown (TDDB) performance. Therefore, the TiO2-based dielectrics with the introduction of Al2O3 might be favorable for the improved engineering of MIM capacitors. (C) 2010 Elsevier Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/j.sse.2010.01.024
http://hdl.handle.net/11536/149953
ISSN: 0038-1101
DOI: 10.1016/j.sse.2010.01.024
期刊: SOLID-STATE ELECTRONICS
Volume: 54
起始頁: 646
結束頁: 649
顯示於類別:期刊論文