標題: Evaluating the abrasive wear of Zn1-xMnxO heteroepitaxial layers using a nanoscratch technique
作者: Chang, Yu-Ming
Wen, Hua-Chiang
Yang, Chu-Shou
Lian, Derming
Tsai, Chien-Huang
Wang, Jyh-Shyang
Wu, Wen-Fa
Chou, Chang-Pin
機械工程學系
Department of Mechanical Engineering
公開日期: 1-八月-2010
摘要: In this study, we used nanoscratch techniques under a ramping load to evaluate the abrasive wear of Zn1-xMnxO epilayers (0 <= x <= 0.16) grown through molecular beam epitaxy (MBE) on sapphire substrates. We analyzed the surface roughness and damage using atomic force microscopy (AFM) and nano-indenter techniques. The scratched surfaces of the Zn1-xMnxO epilayers were significantly different for the various Mn compositions. AFM imaging of the Zn1-xMnxO films revealed that pileup phenomena were important on both sides of each scratch. During the scratching process, we found that cracking dominated in the case of Zn1-xMnxO films while ploughing; also we observed lower values of the coefficient of friction and shallower penetration depths for the films upon increasing the Mn content (x) from 0 to 0.16, suggesting that higher Mn contents provided the Zn1-xMnxO epilayers with higher shear resistances, enhanced by the presence of MnO bonds. (C) 2010 Elsevier Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/j.microrel.2010.05.003
http://hdl.handle.net/11536/150000
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2010.05.003
期刊: MICROELECTRONICS RELIABILITY
Volume: 50
起始頁: 1111
結束頁: 1115
顯示於類別:期刊論文