標題: | Characteristics of emission polarization in a-plane nanorods embedded with InGaN/GaN multiple quantum wells |
作者: | Li, J. C. Lu, T. C. Huang, H. M. Chan, W. W. Kuo, H. C. Wang, S. C. 光電工程學系 Department of Photonics |
關鍵字: | gallium compounds;III-V semiconductors;indium compounds;nanofabrication;nanorods;self-assembly;semiconductor growth;semiconductor quantum wells;wide band gap semiconductors |
公開日期: | 15-九月-2010 |
摘要: | Nonpolar (a-plane) GaN nanorod arrays with embedded In(x)Ga(1-x)N/GaN (x=0.09, 0.14, 0.24, and 0.30) multiple quantum wells (MQWs) grown on r-plane sapphire have been fabricated successfully by self-assembled Ni nanomasks and subsequent inductively coupled plasma reactive-ion etching. After nanorod fabrications, the polarization ratio of the emission from MQWs with lower indium composition (x=0.09 and 0.14) slightly decreases but apparently increases by at most 79% for the samples with higher indium composition (x=0.24 and 0.30). Competition between the effect of multiple scattering, strain relaxation and reduction in localized centers, expected in a-plane MQW samples, are attributed to the variations in the polarization ratios after the nanorod formation. (c) 2010 American Institute of Physics. [doi:10.1063/1.3483239] |
URI: | http://dx.doi.org/10.1063/1.3483239 http://hdl.handle.net/11536/150063 |
ISSN: | 0021-8979 |
DOI: | 10.1063/1.3483239 |
期刊: | JOURNAL OF APPLIED PHYSICS |
Volume: | 108 |
顯示於類別: | 期刊論文 |