標題: | Impacts of cost functions on inverse lithography patterning |
作者: | Yu, Jue-Chin Yu, Peichen 光電工程學系 光電工程研究所 Department of Photonics Institute of EO Enginerring |
公開日期: | 25-十月-2010 |
摘要: | For advanced CMOS processes, inverse lithography promises better patterning fidelity than conventional mask correction techniques due to a more complete exploration of the solution space. However, the success of inverse lithography relies highly on customized cost functions whose design and know-how have rarely been discussed. In this paper, we investigate the impacts of various objective functions and their superposition for inverse lithography patterning using a generic gradient descent approach. We investigate the most commonly used objective functions, which are the resist and aerial images, and also present a derivation for the aerial image contrast. We then discuss the resulting pattern fidelity and final mask characteristics for simple layouts with a single isolated contact and two nested contacts. We show that a cost function composed of a dominant resist-image component and a minor aerial-image or image-contrast component can achieve a good mask correction and contour targets when using inverse lithography patterning. (C) 2010 Optical Society of America |
URI: | http://dx.doi.org/10.1364/OE.18.023331 http://hdl.handle.net/11536/150119 |
ISSN: | 1094-4087 |
DOI: | 10.1364/OE.18.023331 |
期刊: | OPTICS EXPRESS |
Volume: | 18 |
Issue: | 22 |
起始頁: | 23331 |
結束頁: | 23342 |
顯示於類別: | 期刊論文 |