標題: Choosing objective functions for inverse lithography patterning
作者: Yu, Jue-Chin
Yu, Peichen
光電工程學系
Department of Photonics
關鍵字: Microlithography;Inverse lithography;Model-based pattering;Gradient descent;Computational imaging
公開日期: 2011
摘要: Inverse lithography which generates model-based patterns theoretically has superior patterning fidelity comparing to conventional rule-based technique. Cost functions are the determinant of performance inverse lithography that is also an optimization problem. However, the design and know-how of cost functions have rarely been discussed. In this paper, we investigate the impacts of various cost functions and their superposition for inverse lithography patterning exploiting a steepest descent algorithm. We research the most generally used objective functions, which are the resist and aerial images, and also deliver a derivation for the aerial image contrast. We then discuss the pattern fidelity and final mask characteristics for simple layouts with a single isolated contact and two nested contacts. Moreover, the convergences which are expressed by edge-placement error (EPE) and contrast versus iteration numbers rapidly attain to steady sate in most hybrid cost functions. All in all, we conclude that a cost function composed of a dominant resist-image component and a minor aerial-image or image-contrast component can carry out a good mask correction and contour targets when using inverse lithography patterning.
URI: http://hdl.handle.net/11536/1796
http://dx.doi.org/10.1117/12.879440
ISBN: 978-0-81948-532-8
ISSN: 0277-786X
DOI: 10.1117/12.879440
期刊: OPTICAL MICROLITHOGRAPHY XXIV
Volume: 7973
顯示於類別:會議論文


文件中的檔案:

  1. 000294216100052.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。