標題: | Choosing objective functions for inverse lithography patterning |
作者: | Yu, Jue-Chin Yu, Peichen 光電工程學系 Department of Photonics |
關鍵字: | Microlithography;Inverse lithography;Model-based pattering;Gradient descent;Computational imaging |
公開日期: | 2011 |
摘要: | Inverse lithography which generates model-based patterns theoretically has superior patterning fidelity comparing to conventional rule-based technique. Cost functions are the determinant of performance inverse lithography that is also an optimization problem. However, the design and know-how of cost functions have rarely been discussed. In this paper, we investigate the impacts of various cost functions and their superposition for inverse lithography patterning exploiting a steepest descent algorithm. We research the most generally used objective functions, which are the resist and aerial images, and also deliver a derivation for the aerial image contrast. We then discuss the pattern fidelity and final mask characteristics for simple layouts with a single isolated contact and two nested contacts. Moreover, the convergences which are expressed by edge-placement error (EPE) and contrast versus iteration numbers rapidly attain to steady sate in most hybrid cost functions. All in all, we conclude that a cost function composed of a dominant resist-image component and a minor aerial-image or image-contrast component can carry out a good mask correction and contour targets when using inverse lithography patterning. |
URI: | http://hdl.handle.net/11536/1796 http://dx.doi.org/10.1117/12.879440 |
ISBN: | 978-0-81948-532-8 |
ISSN: | 0277-786X |
DOI: | 10.1117/12.879440 |
期刊: | OPTICAL MICROLITHOGRAPHY XXIV |
Volume: | 7973 |
顯示於類別: | 會議論文 |