標題: Fast-Converging Iterative Gradient Decent Methods for High Pattern Fidelity Inverse Mask Design
作者: Yu, Jue-Chin
Yu, Peichen
光電工程學系
Department of Photonics
關鍵字: optical proximity correction;inverse lithography;image gradient
公開日期: 2010
摘要: Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping.
URI: http://hdl.handle.net/11536/16433
http://dx.doi.org/10.1117/12.846568
ISBN: 978-0-8194-8054-5
ISSN: 0277-786X
DOI: 10.1117/12.846568
期刊: OPTICAL MICROLITHOGRAPHY XXIII
Volume: 7640
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