標題: | Fast-Converging Iterative Gradient Decent Methods for High Pattern Fidelity Inverse Mask Design |
作者: | Yu, Jue-Chin Yu, Peichen 光電工程學系 Department of Photonics |
關鍵字: | optical proximity correction;inverse lithography;image gradient |
公開日期: | 2010 |
摘要: | Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping. |
URI: | http://hdl.handle.net/11536/16433 http://dx.doi.org/10.1117/12.846568 |
ISBN: | 978-0-8194-8054-5 |
ISSN: | 0277-786X |
DOI: | 10.1117/12.846568 |
期刊: | OPTICAL MICROLITHOGRAPHY XXIII |
Volume: | 7640 |
顯示於類別: | 會議論文 |