標題: Impacts of cost functions on inverse lithography patterning
作者: Yu, Jue-Chin
Yu, Peichen
光電工程學系
光電工程研究所
Department of Photonics
Institute of EO Enginerring
公開日期: 25-Oct-2010
摘要: For advanced CMOS processes, inverse lithography promises better patterning fidelity than conventional mask correction techniques due to a more complete exploration of the solution space. However, the success of inverse lithography relies highly on customized cost functions whose design and know-how have rarely been discussed. In this paper, we investigate the impacts of various objective functions and their superposition for inverse lithography patterning using a generic gradient descent approach. We investigate the most commonly used objective functions, which are the resist and aerial images, and also present a derivation for the aerial image contrast. We then discuss the resulting pattern fidelity and final mask characteristics for simple layouts with a single isolated contact and two nested contacts. We show that a cost function composed of a dominant resist-image component and a minor aerial-image or image-contrast component can achieve a good mask correction and contour targets when using inverse lithography patterning. (C) 2010 Optical Society of America
URI: http://dx.doi.org/10.1364/OE.18.023331
http://hdl.handle.net/11536/150119
ISSN: 1094-4087
DOI: 10.1364/OE.18.023331
期刊: OPTICS EXPRESS
Volume: 18
Issue: 22
起始頁: 23331
結束頁: 23342
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