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dc.contributor.authorHuang, H. W.en_US
dc.contributor.authorHuang, J. K.en_US
dc.contributor.authorLin, C. H.en_US
dc.contributor.authorLee, K. Y.en_US
dc.contributor.authorHsu, H. W.en_US
dc.contributor.authorYu, C. C.en_US
dc.contributor.authorKuo, H. C.en_US
dc.date.accessioned2019-04-02T06:00:20Z-
dc.date.available2019-04-02T06:00:20Z-
dc.date.issued2010-06-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2010.2045472en_US
dc.identifier.urihttp://hdl.handle.net/11536/150152-
dc.description.abstractThe enhancement of light extraction from GaN-based light-emitting diodes (LEDs) with a patterned sapphire substrate (PSS) and a SiO2 12-fold photonic quasi-crystal (PQC) structure using nanoimprint lithography is presented. At a driving current of 20 mA on transistor-outline-can package, the light output powers of LED with a PSS and LED with a PSS and a SiO2 PQC structure are enhanced by 35% and 48%, compared with the conventional LED. In addition, the higher output power of the LED with a PSS and a SiO2 PQC structure is due to better reflectance on PSS and higher epitaxial quality on an n-GaN using a SiO2 12-fold PQC structure pattern. These results provide promising potential to increase output powers of commercial light-emitting devices.en_US
dc.language.isoen_USen_US
dc.subjectGallium nitride (GaN)en_US
dc.subjectlight-emitting diodes (LEDs)en_US
dc.subjectnanoimprint lithography (NIL)en_US
dc.subjectpatterned sapphire substrate (PSS)en_US
dc.titleEfficiency Improvement of GaN-Based LEDs With a SiO2 Nanorod Array and a Patterned Sapphire Substrateen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2010.2045472en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume31en_US
dc.citation.spage582en_US
dc.citation.epage584en_US
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000284097800012en_US
dc.citation.woscount15en_US
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