標題: Growth of Semipolar InN(10(1)over-bar3) on LaAlO3(112) Substrate
作者: Chen, Wei-Chun
Tian, Jr-Sheng
Wang, Wei-Lin
Ho, Yen-Teng
Chang, Li
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-Apr-2011
摘要: In this study, we report the growth and characterization of semipolar (10 (1) over bar3) InN films grown on LaAlO3(112) substrate by metalorganic molecular beam epitaxy. InN films were grown at various substrate temperatures in the range of 465-540 degrees C. Structural and optical properties of semipolar InN were investigated by high resolution X-ray diffraction, scanning electron microscopy, and photoluminescence measurements. The results show that semipolar (10 (1) over bar3) InN layers can be grown at 510 degrees C with the full-width at half maximum of the X-ray rocking curve about 1400 arcsec and electron mobility of 494 cm(2)V(-1)s(-1). (C) 2011 The Japan Society of Applied Physics
URI: http://dx.doi.org/10.1143/JJAP.50.04DH11
http://hdl.handle.net/11536/150284
ISSN: 0021-4922
DOI: 10.1143/JJAP.50.04DH11
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 50
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