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dc.contributor.authorChen, C. W.en_US
dc.contributor.authorHung, S. C.en_US
dc.contributor.authorLee, C. H.en_US
dc.contributor.authorTun, C. J.en_US
dc.contributor.authorKuo, C. H.en_US
dc.contributor.authorYang, M. D.en_US
dc.contributor.authorYeh, C. W.en_US
dc.contributor.authorWu, C. H.en_US
dc.contributor.authorChi, G. C.en_US
dc.date.accessioned2014-12-08T15:21:11Z-
dc.date.available2014-12-08T15:21:11Z-
dc.date.issued2011-12-01en_US
dc.identifier.issn2159-3930en_US
dc.identifier.urihttp://hdl.handle.net/11536/15038-
dc.description.abstractNonpolar (100) m-plane n-ZnO/p-GaN light-emitting-diodes (LEDs) were grown by chemical vapor deposition on p-GaN templates which was grown by metalorganic chemical vapor deposition on LiAlO(2)(100) substrate. Direct current (DC) electroluminescence (EL) measurements yielded a peak at 458nm. The EL peak position was independent of drive current and a full width of half maximum (FWHM) of 21.8 nm was realized at 20mA. The current-voltage characteristics of these diodes showed a forward voltage (V(f)) of 6V with a series resistance of 2.2 x 10(5) Omega. (C) 2011 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titleNonpolar light emitting diode made by m-plane n-ZnO/p-GaN heterostructureen_US
dc.typeArticleen_US
dc.identifier.journalOPTICAL MATERIALS EXPRESSen_US
dc.citation.volume1en_US
dc.citation.issue8en_US
dc.citation.spage1555en_US
dc.citation.epage1560en_US
dc.contributor.department照明與能源光電研究所zh_TW
dc.contributor.departmentInstitute of Lighting and Energy Photonicsen_US
dc.identifier.wosnumberWOS:000299050200020-
dc.citation.woscount7-
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