標題: | A Novel ReWritable One-Time-Programming OTP (RW-OTP) Realized by Dielectric-fuse RRAM Devices Featuring Ultra-High Reliable Retention and Good Endurance for Embedded Applications |
作者: | Cheng, H. W. Hsieh, E. R. Huang, Z. H. Chuang, C. H. Chen, C. H. Li, F. L. Lo, Y. M. Liu, C. H. Chung, Steve S. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-一月-2018 |
摘要: | A novel concept of OTP has been demonstrated to create another feasibility to allow re-writable capability before storing the data. This OTP is named ReWritable One-time programming (RW-OTP) memory. With RW-OTP, users can do the test by modifying the contexts repeatedly before finalizing the stored data. To implement the memory cell, it consists of a gate-floated FinFET and an RRAM where a bilayer has been designed as a thicker dielectric layer with resistive-switching property on a thinner dielectric-fuse layer. Moreover, the process of RW-OTP is fully compatible with the state-of-the-art CMOS logic technology. The result shows that the memory cell exhibits high retention and good endurance. With proper use of RW-OTP, the users can not only reduce error jobs cost-efficiently but also can develop various applications for their needs. This memory cell is very promising for embedded applications. |
URI: | http://hdl.handle.net/11536/150748 |
ISSN: | 1930-8868 |
期刊: | 2018 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA) |
顯示於類別: | 會議論文 |