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dc.contributor.authorKu, S. H.en_US
dc.contributor.authorLin, T. W.en_US
dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorLee, C. W.en_US
dc.contributor.authorChen, Ti-Wenen_US
dc.contributor.authorTsai, Wen-Jeren_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorLu, W. P.en_US
dc.contributor.authorChen, K. C.en_US
dc.contributor.authorWang, Tahuien_US
dc.contributor.authorLu, Chih-Yuanen_US
dc.date.accessioned2019-04-02T06:04:53Z-
dc.date.available2019-04-02T06:04:53Z-
dc.date.issued2018-01-01en_US
dc.identifier.issn2330-7978en_US
dc.identifier.urihttp://hdl.handle.net/11536/150786-
dc.description.abstractEndurance of floating gate flash memories at 19nm node and beyond is studied comprehensively. Experiments reveal that the random telegraph noise (RTN) would degrade the read margin with a tail, which quickly reshapes into a symmetric Gaussian form in a lightly-stressed state. After heavy stress, the lower part of tail would spread further while the upper part keeps roughly overlapped with that during fresh. This unique behavior, which was firstly measured by the self-established Budget Product Tester (BPT), can be explained by stress-induced hole trap creation. To investigate the impact of RTN on operation window, a novel algorithm of Multi-Times-Verify accompanied with the optimal Read-Retry (MTVR2) is proposed and validated by BPT. The advantage of MTVR2 to reduce the requirement of Error-Correcting Code (ECC) bit is demonstrated. Finally, the improvement of bit error rate (BER) in TLC operation with MTVR(2 )is also evaluated.en_US
dc.language.isoen_USen_US
dc.titleError Characterization and ECC Usage Relaxation beyond 20nm Floating Gate NAND Flash Memoryen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2018 IEEE 10TH INTERNATIONAL MEMORY WORKSHOP (IMW)en_US
dc.citation.spage50en_US
dc.citation.epage53en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000448849300012en_US
dc.citation.woscount1en_US
Appears in Collections:Conferences Paper