標題: | Investigation of Polarization Hysteresis and Transient Current Switching in Ferroelectric Aluminum-Doped Hafnium Oxides |
作者: | Liu, Chien Fan, Chia-Chi Tseng, Chih-Yang Hsu, Hsiao-Hsuan Cheng, Chun-Hu Chen, Yen-Liang Chang, Chun-Yen Chou, Wu-Ching Lin, Chien-Liang Fan, Yu-Chi Lee, Tsung-Ming 光電系統研究所 電子物理學系 電子工程學系及電子研究所 Institute of Photonic System Department of Electrophysics Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-一月-2018 |
摘要: | In this work, we investigated ferroelectric and antiferroelectric effects in ferroelectric HfAIO capacitor with various aluminum doping concentrations. With the increase of aluminum doping concentration, the transition from ferroelectric to weak anti-ferroelectric properties can be observed by measuring polarization hysteresis and transient current response. The experimental results prove that the aluminum doping concentration of HfAIO material not only affects the ferroelectric-antiferroelectric transition, but also determine the leakage issue during domain switching. |
URI: | http://hdl.handle.net/11536/151073 |
期刊: | 2018 14TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT) |
起始頁: | 407 |
結束頁: | 409 |
顯示於類別: | 會議論文 |