完整後設資料紀錄
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dc.contributor.authorZhang, Zi-Huien_US
dc.contributor.authorKou, Jianquanen_US
dc.contributor.authorChen, Sung-Wen Huangen_US
dc.contributor.authorShao, Huaen_US
dc.contributor.authorChe, Jiamangen_US
dc.contributor.authorChu, Chunshuangen_US
dc.contributor.authorTian, Kangkaien_US
dc.contributor.authorZhang, Yonghuien_US
dc.contributor.authorBi, Wengangen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.date.accessioned2019-05-02T00:25:55Z-
dc.date.available2019-05-02T00:25:55Z-
dc.date.issued2019-04-01en_US
dc.identifier.issn2327-9125en_US
dc.identifier.urihttp://dx.doi.org/10.1364/PRJ.7.0000B1en_US
dc.identifier.urihttp://hdl.handle.net/11536/151650-
dc.description.abstractIt is well known that the p-type AlGaN electron blocking layer (p-EBL) can block hole injection for deep ultraviolet light-emitting diodes (DUV LEDs). The polarization induced electric field in the p-EBL for [0001] oriented DUV LEDs makes the holes less mobile and thus further decreases the hole injection capability. Fortunately, enhanced hole injection is doable by making holes lose less energy, and this is enabled by a specifically designed p-EBL structure that has a graded MN composition. The proposed p-EEL can screen the polarization induced electric field in the p-EBL. As a result, holes will lose less energy after going through the proposed p-EBL, which correspondingly leads to the enhanced hole injection. Thus, an external quantum efficiency of 7.6% for the 275 nm DIN LED structure is obtained. (C) 2019 Chinese Laser Pressen_US
dc.language.isoen_USen_US
dc.titleIncreasing the hole energy by grading the alloy composition of the p-type electron blocking layer for very high-performance deep ultraviolet light-emitting diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/PRJ.7.0000B1en_US
dc.identifier.journalPHOTONICS RESEARCHen_US
dc.citation.volume7en_US
dc.citation.issue4en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000462834100001en_US
dc.citation.woscount0en_US
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