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dc.contributor.authorYan, Liang-Jyien_US
dc.contributor.authorKuo, Cheng Huangen_US
dc.contributor.authorSheu, Jinn-Kongen_US
dc.contributor.authorLee, Ming-Lunen_US
dc.contributor.authorTseng, Wei-Chunen_US
dc.date.accessioned2014-12-08T15:21:22Z-
dc.date.available2014-12-08T15:21:22Z-
dc.date.issued2012-03-05en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2011.11.106en_US
dc.identifier.urihttp://hdl.handle.net/11536/15203-
dc.description.abstractNon-alloyed Cr/Au Ohmic contacts on N-face and Ga-face n-GaN were studied. The specific contact resistances (rho(c)) of Cr/Au contacts onto the N-face and Ga-face n-GaN were as low as 2.4 x 10 (4) Omega cm(2) and 2.4 x 10(-5) Omega cm(2), respectively. Native oxide formed on the n-GaN surface was believed to be the key factor for higher rho(c). The results of X-ray photoelectron spectroscopy confirmed that n-GaN samples with different surface polarities or treated by different chemical solutions exhibited significant differences in gallium oxide content on the surface, which led to a marked difference in the rho(c) of non-alloyed Cr/Au Ohmic contacts to GaN films. (C) 2011 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectCr-Auen_US
dc.subjectNonalloyeden_US
dc.subjectOhmicen_US
dc.titleNon-alloyed Cr/Au Ohmic contacts to N-face and Ga-face n-GaNen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jallcom.2011.11.106en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume516en_US
dc.citation.issueen_US
dc.citation.spage38en_US
dc.citation.epage40en_US
dc.contributor.department照明與能源光電研究所zh_TW
dc.contributor.departmentInstitute of Lighting and Energy Photonicsen_US
dc.identifier.wosnumberWOS:000299106600008-
dc.citation.woscount1-
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