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dc.contributor.authorSumino, Shuheien_US
dc.contributor.authorRyu, Ilhyongen_US
dc.date.accessioned2019-08-02T02:15:30Z-
dc.date.available2019-08-02T02:15:30Z-
dc.date.issued2019-05-01en_US
dc.identifier.issn0037-9980en_US
dc.identifier.urihttp://dx.doi.org/10.5059/yukigoseikyokaishi.77.406en_US
dc.identifier.urihttp://hdl.handle.net/11536/152200-
dc.description.abstractRadical addition/beta-fragmentation sequence has long been utilized for alkenylation and allylation of alkyl halides, in which key alkyl radicals are generated from alkyl halides by S(H)2 reaction typically using tributyltin radical. In this article, we describe modernized alkenylation and allylation of alkyl halides, in which alkyl radical generation is carried out by electron transfer under photoirradiation with the use of transition metal catalyst, which enables us to carry out the radical alkenylation and allylation without the use of radical initiators nor chain transfer reagents. Indeed, radical alkenylation of alkyl iodides using alkenyl bromides proceeded well by the use of a Pd/light combined system involving Hantzsch ester. Alkenyl and allyl sulfones worked better, since the system can obviate the use of Hantzsch ester. Mechanistically spontaneous reductive elimination of PhSO2I is suggested to recover the Pd catalyst. We also discuss allylation of gem-difluoromethylene-containing alkyl halides using allyl sulfones, which is best performed by the use of a visible light photoredox system based on Ru-catalyst.en_US
dc.language.isoen_USen_US
dc.subjectphoto catalysten_US
dc.subjectradicalen_US
dc.subjectelectron-transferen_US
dc.subjectaddition/beta-fragmentationen_US
dc.subjectalkenylationen_US
dc.subjectallylationen_US
dc.titleAlkenylation and Allylation Reactions of Alkyl Halides Using Photo Catalysten_US
dc.typeArticleen_US
dc.identifier.doi10.5059/yukigoseikyokaishi.77.406en_US
dc.identifier.journalJOURNAL OF SYNTHETIC ORGANIC CHEMISTRY JAPANen_US
dc.citation.volume77en_US
dc.citation.issue5en_US
dc.citation.spage406en_US
dc.citation.epage413en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000472590100002en_US
dc.citation.woscount0en_US
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