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dc.contributor.authorChen, Yen-Tingen_US
dc.contributor.authorYang, Jianchengen_US
dc.contributor.authorRen, Fanen_US
dc.contributor.authorChang, Chin-Weien_US
dc.contributor.authorLin, Jenshanen_US
dc.contributor.authorPearton, S. J.en_US
dc.contributor.authorTadjer, Marko J.en_US
dc.contributor.authorKuramata, Akitoen_US
dc.contributor.authorLiao, Yu-Teen_US
dc.date.accessioned2019-08-02T02:18:33Z-
dc.date.available2019-08-02T02:18:33Z-
dc.date.issued2019-05-22en_US
dc.identifier.issn2162-8769en_US
dc.identifier.urihttp://dx.doi.org/10.1149/2.0421907jssen_US
dc.identifier.urihttp://hdl.handle.net/11536/152364-
dc.description.abstractThis paper presents a switching circuit for high breakdown-voltage Ga2O3 vertical Schottky rectifiers. Field-plated edge-terminated (FPET) vertical Schottky diodes were fabricated on a 20-mu m thick Si-doped n-type Ga2O3 drift layer which was grown on the 650-mu m thick beta-Ga2O3 substrate via halide vapor phase epitaxy (HVPE). The measured reverse recovery time of the proposed Ga2O3 Schottky diode was 81 ns when switched to a reverse bias voltage of -900 V. The implementation of a switching circuit with the novel Ga2O3 diode is the first demonstrated at such a high switching voltage. This paper also provides insights for the practical implementation of the Ga2O3 vertical Schottky rectifiers from device fabrication to circuit design. (C) The Author(s) 2019. Published by ECS.en_US
dc.language.isoen_USen_US
dc.titleImplementation of a 900 V Switching Circuit for High Breakdown Voltage beta-Ga2O3 Schottky Diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/2.0421907jssen_US
dc.identifier.journalECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGYen_US
dc.citation.volume8en_US
dc.citation.issue7en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000468728400001en_US
dc.citation.woscount0en_US
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