完整後設資料紀錄
DC 欄位語言
dc.contributor.authorSimanjuntak, Firman Mangasaen_US
dc.contributor.authorChandrasekaran, Sridharen_US
dc.contributor.authorLin, Chun-Chiehen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2019-08-02T02:18:37Z-
dc.date.available2019-08-02T02:18:37Z-
dc.date.issued2019-05-01en_US
dc.identifier.issn2166-532Xen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.5092991en_US
dc.identifier.urihttp://hdl.handle.net/11536/152417-
dc.description.abstractHydrogen peroxide treatment induces the phase transformation of hexagonal ZnO to cubic ZnO2 on the surface of the ZnO switching memory film; this oxidation process effectively reduces the concentration of n-type donor defects (oxygen vacancies and zinc interstitials) in the switching film. The chemically oxidized ZnO2 layer not only lowers the operation current of the device but also can serve as an oxygen bank to improve the endurance of the memristor. The oxidation reaction of peroxide treatment can be easily controlled to achieve an analog behavior with good switching uniformity. The analog memristor device is able to perform two-bit per cell and synaptic operations. Based on the experimental synaptic data, an image processing of 7 x 9 pixels using a simulated artificial neural network comprises 63 synapses is evaluated to mimic the visual cortex function of the brain.en_US
dc.language.isoen_USen_US
dc.titleZnO2/ZnO bilayer switching film for making fully transparent analog memristor devicesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.5092991en_US
dc.identifier.journalAPL MATERIALSen_US
dc.citation.volume7en_US
dc.citation.issue5en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000470152400008en_US
dc.citation.woscount0en_US
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