標題: Investigation of Degradation Phenomena in GaN-on-Si Power MIS-HEMTs under Source Current and Drain Bias Stresses
作者: Yang, Chih-Yi
Wu, Tian-Li
Hsieh, Tin-En
Chang, Edward Yi
材料科學與工程學系
電子工程學系及電子研究所
國際半導體學院
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
International College of Semiconductor Technology
關鍵字: GaN-on-Si;MIS-HEMT;trapping;degradation;current stress condition
公開日期: 1-Jan-2018
摘要: In this paper, we investigate the degradation phenomena in GaN-on-Si Metal-Insulator-Semiconductor High electron Mobility Transistors (MIS-HEMTs) in the cascode topography for enhancement mode power switching applications. Different stress conditions, e.g., constant source current (Is=100(mu A)=2(mA/mm) and 100(nA)=2 x 10(-3)(mA/mm)) and drain voltages (V-D=1(V), 10(V), 100(V), and 200(V)), are used to investigate the source current and drain bias dependent degradation. First, the VTH shift is correlated with the RoN increase under a low drain bias stress (V-D<10(V)). However, under a high drain bias stress, the trapping location is most probably in the gate-to-drain access region, leading a different degradation phenomena compared to the case under a low drain bias stress. Furthermore, we found that the devices are stressed under a different source current stress show a similar degradation phenomenon. This suggests that, in the cascode circuit topology, the instability degradation is still mainly triggered by the drain bias.
URI: http://hdl.handle.net/11536/152444
ISBN: 978-1-5386-5479-8
ISSN: 1541-7026
期刊: 2018 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS)
起始頁: 0
結束頁: 0
Appears in Collections:Conferences Paper