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dc.contributor.authorNakatsuka, Osamuen_US
dc.contributor.authorBaklanov, Mikhail R.en_US
dc.contributor.authorZhao, Chaoen_US
dc.contributor.authorChan, Mansunen_US
dc.contributor.authorLeu, Jihperngen_US
dc.contributor.authorLuo, Junen_US
dc.contributor.authorQu, Xin-Pingen_US
dc.contributor.authorSaitoh, Takeyasuen_US
dc.contributor.authorSuzuki, Keisukeen_US
dc.contributor.authorYokogawa, Shinjien_US
dc.date.accessioned2019-09-02T07:46:16Z-
dc.date.available2019-09-02T07:46:16Z-
dc.date.issued2019-07-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.7567/1347-4065/ab2533en_US
dc.identifier.urihttp://hdl.handle.net/11536/152657-
dc.language.isoen_USen_US
dc.titleAdvanced metallization for ULSI applications FOREWORDen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/1347-4065/ab2533en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume58en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000476921500001en_US
dc.citation.woscount0en_US
Appears in Collections:Articles


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