金屬線及空氣低介電常數介電質前瞻性積體技術開發(II)

Title:	金屬線及空氣低介電常數介電質前瞻性積體技術開發(II) Advanced Integration Techonology of Intermetal and Air Gap Low k Dielectrics for ULSI Application (II)
Authors:	張國明 CHANG KOW-MING 國立交通大學電子工程學系
Keywords:	金屬線;低介電常數;極大型積體電路;氣隙;Metal wire;Low dielectric constant;ULSI;Air gap
Issue Date:	2001
Gov't Doc #:	NSC90-2215-E009-046
URI:	http://hdl.handle.net/11536/97684 https://www.grb.gov.tw/search/planDetail?id=665627&docId=126354
Appears in Collections:	Research Plans

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APA	張., & CHANG K. (2001). 金屬線及空氣低介電常數介電質前瞻性積體技術開發(II). https://www.grb.gov.tw/search/planDetail?id=665627&docId=126354.
Bibtex	@article{2001, title={金屬線及空氣低介電常數介電質前瞻性積體技術開發(II)}, author={張國明 and CHANG KOW-MING}, journal={https://www.grb.gov.tw/search/planDetail?id=665627&docId=126354}, year={2001}, url={https://ir.lib.nycu.edu.tw/handle/11536/97684}, }