完整後設資料紀錄
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dc.contributor.authorGan, Kai-Jhihen_US
dc.contributor.authorLiu, Po-Tsunen_US
dc.contributor.authorLin, Sheng-Jieen_US
dc.contributor.authorRuan, Dun-Baoen_US
dc.contributor.authorChien, Ta-Chunen_US
dc.contributor.authorChiu, Yu-Chuanen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2019-10-05T00:08:42Z-
dc.date.available2019-10-05T00:08:42Z-
dc.date.issued2019-08-01en_US
dc.identifier.issn0042-207Xen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.vacuum.2019.05.023en_US
dc.identifier.urihttp://hdl.handle.net/11536/152823-
dc.description.abstractThe purpose of this work is to develop a reliable amorphous tungsten-doped indium-zinc oxide based conductive-bridging random access memory (CBRAM). The device with Cu/TiW/InWZnO/Pt structure exhibits stable bipolar resistive switching behavior. The device also shows good non-volatile memory characteristics, such as low operation voltage, on/off resistance ratio (similar to 10(2)), high switching endurance (more than 5 x 10(2) cycles). The temperature coefficient of resistance in the conductive filament confirms that an electro-chemical metallization (ECM) based conduction is observed in the InWZnO device. Furthermore, the temperature retention characteristics and the current transport mechanisms are also investigated. According to our experiments, we propose a model to explain the resistive switching phenomenon observed in our devices. These results have given a great potential for the transparent amorphous oxide semiconductor (TAOS)-based material utilizing in CBRAM stacks and integrating into the display circuits for future memory-in-pixel applications.en_US
dc.language.isoen_USen_US
dc.subjectIndium-tungsten-zinc-oxideen_US
dc.subjectNon-volatile memories (NVM)en_US
dc.subjectConductive-bridging random access memory (CBRAM)en_US
dc.subjectPhysical vapor depositionen_US
dc.titleBipolar resistive switching characteristics of tungsten-doped indium-zinc oxide conductive-bridging random access memoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.vacuum.2019.05.023en_US
dc.identifier.journalVACUUMen_US
dc.citation.volume166en_US
dc.citation.spage226en_US
dc.citation.epage230en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000472990900036en_US
dc.citation.woscount0en_US
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