完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Gan, Kai-Jhih | en_US |
dc.contributor.author | Liu, Po-Tsun | en_US |
dc.contributor.author | Lin, Sheng-Jie | en_US |
dc.contributor.author | Ruan, Dun-Bao | en_US |
dc.contributor.author | Chien, Ta-Chun | en_US |
dc.contributor.author | Chiu, Yu-Chuan | en_US |
dc.contributor.author | Sze, Simon M. | en_US |
dc.date.accessioned | 2019-10-05T00:08:42Z | - |
dc.date.available | 2019-10-05T00:08:42Z | - |
dc.date.issued | 2019-08-01 | en_US |
dc.identifier.issn | 0042-207X | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.vacuum.2019.05.023 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/152823 | - |
dc.description.abstract | The purpose of this work is to develop a reliable amorphous tungsten-doped indium-zinc oxide based conductive-bridging random access memory (CBRAM). The device with Cu/TiW/InWZnO/Pt structure exhibits stable bipolar resistive switching behavior. The device also shows good non-volatile memory characteristics, such as low operation voltage, on/off resistance ratio (similar to 10(2)), high switching endurance (more than 5 x 10(2) cycles). The temperature coefficient of resistance in the conductive filament confirms that an electro-chemical metallization (ECM) based conduction is observed in the InWZnO device. Furthermore, the temperature retention characteristics and the current transport mechanisms are also investigated. According to our experiments, we propose a model to explain the resistive switching phenomenon observed in our devices. These results have given a great potential for the transparent amorphous oxide semiconductor (TAOS)-based material utilizing in CBRAM stacks and integrating into the display circuits for future memory-in-pixel applications. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Indium-tungsten-zinc-oxide | en_US |
dc.subject | Non-volatile memories (NVM) | en_US |
dc.subject | Conductive-bridging random access memory (CBRAM) | en_US |
dc.subject | Physical vapor deposition | en_US |
dc.title | Bipolar resistive switching characteristics of tungsten-doped indium-zinc oxide conductive-bridging random access memory | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.vacuum.2019.05.023 | en_US |
dc.identifier.journal | VACUUM | en_US |
dc.citation.volume | 166 | en_US |
dc.citation.spage | 226 | en_US |
dc.citation.epage | 230 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000472990900036 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |