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dc.contributor.authorWang, Weien_US
dc.contributor.authorLaudato, Marioen_US
dc.contributor.authorAmbrosi, Eliaen_US
dc.contributor.authorBricalli, Alessandroen_US
dc.contributor.authorCovi, Erikaen_US
dc.contributor.authorLin, Yu-Hsuanen_US
dc.contributor.authorIelmini, Danieleen_US
dc.date.accessioned2019-10-05T00:08:42Z-
dc.date.available2019-10-05T00:08:42Z-
dc.date.issued2019-09-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2019.2928888en_US
dc.identifier.urihttp://hdl.handle.net/11536/152824-
dc.description.abstractResistive-switching random access memory (RRAM) based on Cu or Ag filament is a promising selector device for high-density crosspoint arrays. These devices display high ON-OFF ratio, volatile switching, high switching speed, and long endurance, supporting the adoption in large memory arrays. However, the mechanism of volatile switching is not clear yet, which prevents the development of compact models for circuit design and simulation. Based on an extensive study of the switching mechanism, we report an analytical model that captures all electrical characteristics of the device, including switching, recovery, and their dependence on the applied voltage. We use the analytical model to simulate the circuit-level behavior of the device as long/short term memory synapse.en_US
dc.language.isoen_USen_US
dc.subjectAnalytical modelen_US
dc.subjectneuromorphic computingen_US
dc.subjectretention timeen_US
dc.subjectselective deviceen_US
dc.subjectvolatile switchingen_US
dc.titleVolatile Resistive Switching Memory Based on Ag Ion Drift/Diffusion-Part II: Compact Modelingen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2019.2928888en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume66en_US
dc.citation.issue9en_US
dc.citation.spage3802en_US
dc.citation.epage3808en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000482583200015en_US
dc.citation.woscount1en_US
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