Femtosecond-laser ablation of monolayer molybdenum disulfide (MoS2) on sapphire

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Solomon, Joel M.	en_US
dc.contributor.author	Yao, Hsin-Yu	en_US
dc.contributor.author	Lu, Li-Syuan	en_US
dc.contributor.author	Chang, Wen-Hao	en_US
dc.contributor.author	Her, Tsing-Hua	en_US
dc.date.accessioned	2019-10-05T00:09:43Z	-
dc.date.available	2019-10-05T00:09:43Z	-
dc.date.issued	2019-01-01	en_US
dc.identifier.isbn	978-1-943580-57-6	en_US
dc.identifier.issn	2160-9020	en_US
dc.identifier.uri	http://hdl.handle.net/11536/152912	-
dc.description.abstract	Single-shot femtosecond laser ablation of monolayer molybdenum disulfide is demonstrated. An ablation threshold was found 0.9 nJ/mu m(2), which is too low for two-photon photoionization alone. We show that surface defects and avalanche ionization are important. (C) 2019 The Author(s)	en_US
dc.language.iso	en_US	en_US
dc.title	Femtosecond-laser ablation of monolayer molybdenum disulfide (MoS2) on sapphire	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	2019 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO)	en_US
dc.citation.spage	0	en_US
dc.citation.epage	0	en_US
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	Department of Electrophysics	en_US
dc.identifier.wosnumber	WOS:000482226300306	en_US
dc.citation.woscount	0	en_US
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