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dc.contributor.authorLin, Shih-Kaien_US
dc.contributor.authorChen, Min-Chenen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLien, Chen-Hsinen_US
dc.contributor.authorChang, Jing-Shuenen_US
dc.contributor.authorWu, Cheng-Hsienen_US
dc.contributor.authorTseng, Yi-Tingen_US
dc.contributor.authorXu, You-Linen_US
dc.contributor.authorHuang, Kai-Linen_US
dc.contributor.authorSun, Li-Chuanen_US
dc.contributor.authorZhang, Yong-Cien_US
dc.contributor.authorChiu, Yu-Juen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2019-12-13T01:09:52Z-
dc.date.available2019-12-13T01:09:52Z-
dc.date.issued2019-10-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2019.2935542en_US
dc.identifier.urihttp://hdl.handle.net/11536/152999-
dc.description.abstractThis letter investigates Au30Ag70 (alloy electrode)/SiO2/TiN conductive-bridge random access memory (CBRAM) to verify the influence of ambient conditions on forming voltage (V-F) and the location of galvanic reaction. Previous literature demonstrates that the galvanic reaction in CBRAM with an alloy electrode results in a lower V-F. In this work, a higher environmental H2O concentration results in a decrease in V-F. From this change in VF, we infer that environmental H2O concentration influences the amount of galvanic reaction. Moreover, we verify the location of the galvanic reaction by varying electrode thickness. Finally, we propose a physical model to explain our observations.en_US
dc.language.isoen_USen_US
dc.subjectCBRAMen_US
dc.subjectalloy electrodeen_US
dc.subjectgalvanic reactionen_US
dc.subjecthumidityen_US
dc.titleThe Effect of Humidity on Reducing Forming Voltage in Conductive-Bridge Random Access Memory With an Alloy Electrodeen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2019.2935542en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume40en_US
dc.citation.issue10en_US
dc.citation.spage1606en_US
dc.citation.epage1609en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000489740400010en_US
dc.citation.woscount0en_US
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