標題: Analysis and design of wideband active power splitter with interleaf transmission line topology
作者: Huang, Ching-Ying
Hu, Robert
Niu, Dow-Chi
Chang, Chi-Yang
電機學院
College of Electrical and Computer Engineering
關鍵字: III-V semiconductors;CMOS integrated circuits;gallium arsenide;HEMT integrated circuits;transmission lines;field effect MIMIC;network topology;interleaf topology;interleaf transmission line topology;high-frequency performance;wideband active power splitter;interleaf active power splitter;circuit simulation;GaAs pHEMT process;CMOS integrated circuit;output-port isolation;size 0;1 mum;frequency 40;0 GHz;size 90;0 nm;frequency 20;0 GHz;GaAs
公開日期: 1-Nov-2019
摘要: This article proposes a new wideband active power splitter design where the gain cells along the input transmission line are arranged in interleaf rather than the conventional parallel style, thus the circuit's high-frequency performance can be greatly improved. Both theoretical analysis and circuit simulation have been carried out; as a demonstration, parallel and interleaf active power splitters are designed using 0.1 mu m GaAs pseudo-morphic heterostructure field effect transistors (GaAs pHEMT) process and measured on-wafer. The results clearly indicate the superiority of the interleaf topology. A 40 GHz interleaf active power splitter in 90 nm complementary metal-oxide-semiconductor (CMOS) is then presented where the magnitude and phase imbalance between the two output ports are 0.15 dB and 2.6 degrees at 20 GHz, and 0.16 dB and 14 degrees at 40 GHz. The output-port isolation is better than 30 dB across the whole frequency range.
URI: http://dx.doi.org/10.1049/iet-cds.2018.5579
http://hdl.handle.net/11536/153351
ISSN: 1751-858X
DOI: 10.1049/iet-cds.2018.5579
期刊: IET CIRCUITS DEVICES & SYSTEMS
Volume: 13
Issue: 8
起始頁: 1262
結束頁: 1266
Appears in Collections:Articles