標題: | Resistive switching characteristics of ytterbium oxide thin film for nonvolatile memory application |
作者: | Tseng, Hsueh-Chih Chang, Ting-Chang Huang, Jheng-Jie Chen, Yu-Ting Yang, Po-Chun Huang, Hui-Chun Gan, Der-Shin Ho, New-Jin Sze, Simon M. Tsai, Ming-Jinn 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Nonvolatile resistance switching memory;RRAM;Yb2O3;Forming |
公開日期: | 30-十二月-2011 |
摘要: | This paper studies the effects of both the positive and negative forming processes on the resistive switching characteristics of a Pt/Yb(2)O(3)/TiN RRAM device. The polarity of the forming process can determine the transition mechanism, either bipolar or unipolar. Bipolar behavior exists after the positive forming process, while unipolar behavior exists after the negative forming process. Furthermore, the bipolar switching characteristics of the Pt/Yb(2)O(3)/TiN device can be affected by using a reverse polarity forming treatment, which not only reduces the set and reset voltage, but also improves the on/off ratio. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.tsf.2011.07.026 http://hdl.handle.net/11536/15350 |
ISSN: | 0040-6090 |
DOI: | 10.1016/j.tsf.2011.07.026 |
期刊: | THIN SOLID FILMS |
Volume: | 520 |
Issue: | 5 |
起始頁: | 1656 |
結束頁: | 1659 |
顯示於類別: | 期刊論文 |