Title: Resistive switching characteristics of ytterbium oxide thin film for nonvolatile memory application
Authors: Tseng, Hsueh-Chih
Chang, Ting-Chang
Huang, Jheng-Jie
Chen, Yu-Ting
Yang, Po-Chun
Huang, Hui-Chun
Gan, Der-Shin
Ho, New-Jin
Sze, Simon M.
Tsai, Ming-Jinn
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
Keywords: Nonvolatile resistance switching memory;RRAM;Yb2O3;Forming
Issue Date: 30-Dec-2011
Abstract: This paper studies the effects of both the positive and negative forming processes on the resistive switching characteristics of a Pt/Yb(2)O(3)/TiN RRAM device. The polarity of the forming process can determine the transition mechanism, either bipolar or unipolar. Bipolar behavior exists after the positive forming process, while unipolar behavior exists after the negative forming process. Furthermore, the bipolar switching characteristics of the Pt/Yb(2)O(3)/TiN device can be affected by using a reverse polarity forming treatment, which not only reduces the set and reset voltage, but also improves the on/off ratio. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2011.07.026
http://hdl.handle.net/11536/15350
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.07.026
Journal: THIN SOLID FILMS
Volume: 520
Issue: 5
Begin Page: 1656
End Page: 1659
Appears in Collections:Articles


Files in This Item:

  1. 000299233000054.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.