標題: | Photo-polymerization of photocurable resins containing polyhedral oligomeric silsesquioxane methacrylate |
作者: | Lin, Ho-May Wu, Shi-Yin Chang, Feng-Chih Yen, Ying-Chieh 應用化學系 Department of Applied Chemistry |
關鍵字: | Polyhedral oligomeric silsesquioxanes (POSSs);Photocurable resins;Hydrogen bonding;Acrylate monomer |
公開日期: | 15-Dec-2011 |
摘要: | Photocurable resins, bisphenol A propoxylate glycerolate diacrylate (BPA-PGDA, containing two hydroxyl) and bisphenol A propoxylate diacrylate (BPA-PDA), with fixed photoinitiator (Irgacure 907) concentration and various contents of methacrylisobutyl polyhedral oligomeric silsesquioxane (MI-POSS) were prepared and characterized by FTIR spectroscopy, scanning electron microscope and differential photocalorimetry. The MI-POSS molecules form crystals or aggregated particles in the cured resin matrix. The BPA-PGDA series photocurable resins show higher viscosity and lower photo-polymerization reactivity than the BPA-PDA series resins. The photo-polymerization rate and conversion of BPA-PGDA series are improved with increasing MI-POSS content. On the contrary, the photo-polymerization behavior of BPA-PDA series photocurable resins remains nearly unchanged by the addition of MI-POSS. Hydrogen-bonding interaction between the hydroxyl of BPA-PGDA and the siloxane of MI-POSS tends to attract and concentrate these acrylate double bonds around MI-POSS particles and thus enhances the photo-polymerization rate and conversion. (C) 2011 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.matchemphys.2011.09.061 http://hdl.handle.net/11536/15360 |
ISSN: | 0254-0584 |
DOI: | 10.1016/j.matchemphys.2011.09.061 |
期刊: | MATERIALS CHEMISTRY AND PHYSICS |
Volume: | 131 |
Issue: | 1-2 |
起始頁: | 393 |
結束頁: | 399 |
Appears in Collections: | Articles |
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