标题: Photo-polymerization of photocurable resins containing polyhedral oligomeric silsesquioxane methacrylate
作者: Lin, Ho-May
Wu, Shi-Yin
Chang, Feng-Chih
Yen, Ying-Chieh
应用化学系
Department of Applied Chemistry
关键字: Polyhedral oligomeric silsesquioxanes (POSSs);Photocurable resins;Hydrogen bonding;Acrylate monomer
公开日期: 15-十二月-2011
摘要: Photocurable resins, bisphenol A propoxylate glycerolate diacrylate (BPA-PGDA, containing two hydroxyl) and bisphenol A propoxylate diacrylate (BPA-PDA), with fixed photoinitiator (Irgacure 907) concentration and various contents of methacrylisobutyl polyhedral oligomeric silsesquioxane (MI-POSS) were prepared and characterized by FTIR spectroscopy, scanning electron microscope and differential photocalorimetry. The MI-POSS molecules form crystals or aggregated particles in the cured resin matrix. The BPA-PGDA series photocurable resins show higher viscosity and lower photo-polymerization reactivity than the BPA-PDA series resins. The photo-polymerization rate and conversion of BPA-PGDA series are improved with increasing MI-POSS content. On the contrary, the photo-polymerization behavior of BPA-PDA series photocurable resins remains nearly unchanged by the addition of MI-POSS. Hydrogen-bonding interaction between the hydroxyl of BPA-PGDA and the siloxane of MI-POSS tends to attract and concentrate these acrylate double bonds around MI-POSS particles and thus enhances the photo-polymerization rate and conversion. (C) 2011 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.matchemphys.2011.09.061
http://hdl.handle.net/11536/15360
ISSN: 0254-0584
DOI: 10.1016/j.matchemphys.2011.09.061
期刊: MATERIALS CHEMISTRY AND PHYSICS
Volume: 131
Issue: 1-2
起始页: 393
结束页: 399
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