標題: | Moisture uptake and dielectric property of methylsilsesquioxane/high-temperature porogen hybrids and porous low-k films |
作者: | Che, Mu-Lung Teng, Jun-Yuan Lai, Po-Cheng Leu, Jihperng 材料科學與工程學系 Department of Materials Science and Engineering |
公開日期: | 1-十二月-2011 |
摘要: | Two high-temperature pore generators (porogens) have been used to study the effect of porogen structure on moisture uptake and k-value in methylsilsesquioxane/porogen hybrid films and their corresponding porous films in a postintegration porogen removal scheme. Poly(styrene-b-4-vinylpyridine) containing di-block structure and pyridine polar group leads to higher moisture uptake and k-value in the hybrid films as compared to poly(styrene-block-butadiene-block-styrene) with symmetrical structure and nonpolar groups. Moreover, the moisture uptake behavior in both as-prepared hybrid films is in physical sorption mode based on their reversible adsorption-desorption curve measured by quartz crystal microbalance. After porogen removal, the k-values of porous films are favorably not influenced by porogen structures, and their moisture uptake is as low as 1.78 wt% even at 40 vol.% porosity. However, based on the simulation of the modified-Rayleigh model, the porous films are found to possess 0.4 vol.% chemisorbed moisture on the pore surface, resulting in 17-23% deviation from the ideal k-values. |
URI: | http://dx.doi.org/10.1557/jmr.2011.384 http://hdl.handle.net/11536/15365 |
ISSN: | 0884-2914 |
DOI: | 10.1557/jmr.2011.384 |
期刊: | JOURNAL OF MATERIALS RESEARCH |
Volume: | 26 |
Issue: | 23 |
起始頁: | 2987 |
結束頁: | 2995 |
顯示於類別: | 期刊論文 |