完整後設資料紀錄
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dc.contributor.authorLu, Cheng-Hsienen_US
dc.contributor.authorYang, Yi-Lunen_US
dc.contributor.authorChen, Chiao-Peien_US
dc.contributor.authorTsai, Bin-Lingen_US
dc.contributor.authorChen, Kuan-Nengen_US
dc.date.accessioned2020-03-02T03:23:28Z-
dc.date.available2020-03-02T03:23:28Z-
dc.date.issued2020-01-01en_US
dc.identifier.issn2156-3950en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TCPMT.2019.2942128en_US
dc.identifier.urihttp://hdl.handle.net/11536/153738-
dc.description.abstractThis article investigates the adhesion properties between the polyimide layers and the Ti/Cu layer after the electroplating process. The adhesion strength was evaluated by the four-point bending system, and the influence factors were confirmed by using different electroplating times and currents. The fracture interface after the four-point bending measurement was characterized, and the interface spectrum between the polyimide and the Ti/Cu layer was analyzed. The results showed that the modified polyimide-like material has better adhesion performance than the conventional polyimide. Moreover, the mechanism of degradation was proposed. As a result, the modified polyimide-like material can be applied in electroplating, a redistribution layer (RDL) formation, and packaging at the back-end-of-line processes.en_US
dc.language.isoen_USen_US
dc.subjectPolyimidesen_US
dc.subjectAdhesivesen_US
dc.subjectPlatingen_US
dc.subjectMetalsen_US
dc.subjectPackagingen_US
dc.subjectAdhesionen_US
dc.subjectelectroplatingen_US
dc.subjectpolyimideen_US
dc.subjectX-ray photoelectron spectroscopy (XPS)en_US
dc.titleAdhesion Properties of Electroplating Process Between Polyimide and Metal Layer for Polymer/Metal Hybrid Bondingen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TCPMT.2019.2942128en_US
dc.identifier.journalIEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGYen_US
dc.citation.volume10en_US
dc.citation.issue1en_US
dc.citation.spage168en_US
dc.citation.epage175en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000508385200020en_US
dc.citation.woscount0en_US
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