完整後設資料紀錄
DC 欄位語言
dc.contributor.authorZhou, Kuan-Juen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLin, Chih-Yangen_US
dc.contributor.authorChen, Chun-Kueien_US
dc.contributor.authorTseng, Yi-Tingen_US
dc.contributor.authorZheng, Hao-Xuanen_US
dc.contributor.authorChen, Hong-Chihen_US
dc.contributor.authorSun, Li-Chuanen_US
dc.contributor.authorLien, Chih-Yingen_US
dc.contributor.authorTan, Yung-Fangen_US
dc.contributor.authorWu, Chung-Weien_US
dc.contributor.authorYeh, Yu-Hsuanen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2020-03-02T03:23:32Z-
dc.date.available2020-03-02T03:23:32Z-
dc.date.issued2020-02-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2019.2961408en_US
dc.identifier.urihttp://hdl.handle.net/11536/153808-
dc.description.abstractIn this letter, the electrical characteristics of Ti/HfO2/TiN resistive random access memory (RRAM) were thoroughly investigated. An abnormal current degradation was seen in the DC sweeping cycle. Both the on-state and off-state current clearly exhibited degradation with time. Next, current fitting analysis was used to investigate the carrier transport mechanisms. The results indicate that the on-state carrier transport mechanism changed from space-charge-limited current into hopping conduction after cycle sweeping. However, the off-state current changes from Schottky thermal emission to hopping conduction. Based on comparisons of different Schottky distances and Schottky barriers, physical models were proposed to explain the abnormal current degradation behavior. Finally, COMSOL electric field simulations were used to show the electric field distribution around the conducting filament (CF), and the conducting model was subsequently verified.en_US
dc.language.isoen_USen_US
dc.subjectTitaniumen_US
dc.subjectHafnium oxideen_US
dc.subjectSchottky thermal emissionen_US
dc.subjecthopping conductionen_US
dc.titleAbnormal High Resistive State Current Mechanism Transformation in Ti/HfO2/TiN Resistive Random Access Memoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2019.2961408en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume41en_US
dc.citation.issue2en_US
dc.citation.spage224en_US
dc.citation.epage227en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000510750200005en_US
dc.citation.woscount0en_US
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