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dc.contributor.authorHuang, Shih-Enen_US
dc.contributor.authorLin, Shih-Hanen_US
dc.contributor.authorSu, Pinen_US
dc.date.accessioned2020-03-02T03:23:33Z-
dc.date.available2020-03-02T03:23:33Z-
dc.date.issued2020-01-01en_US
dc.identifier.issn2168-6734en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JEDS.2020.2966642en_US
dc.identifier.urihttp://hdl.handle.net/11536/153825-
dc.description.abstractThis paper investigates the inversion charge characteristics and quantum-capacitance induced inversion charge loss for In0.53Ga0.47As negative-capacitance FinFETs (NC-FinFETs) using theoretical calculation corroborated with numerical simulation. Our study indicates that, the boost of inversion charges due to negative capacitance increases with increasing remnant polarization P-r. In addition, the inversioncharge boosting for the In0.53Ga0.47As device is significantly larger than that of the Si (110) device due to the step-like inversion capacitance characteristic stemming from the 2D density-of-states of the In0.53Ga0.47As device. In other words, the quantum-capacitance induced inversion-charge loss for III-V channel can be mitigated in NCFETs.en_US
dc.language.isoen_USen_US
dc.subjectNegative-capacitance FET (NCFET)en_US
dc.subjectquantum capacitanceen_US
dc.subjectFinFET structureen_US
dc.subjectCMOSen_US
dc.subjectInGaAsen_US
dc.titleInvestigation of Inversion Charge Characteristics and Inversion Charge Loss for InGaAs Negative-Capacitance Double-Gate FinFETs Considering Quantum Capacitanceen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JEDS.2020.2966642en_US
dc.identifier.journalIEEE JOURNAL OF THE ELECTRON DEVICES SOCIETYen_US
dc.citation.volume8en_US
dc.citation.issue1en_US
dc.citation.spage105en_US
dc.citation.epage109en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000510901100001en_US
dc.citation.woscount0en_US
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