完整後設資料紀錄
DC 欄位語言
dc.contributor.authorLi, Yu-Jinen_US
dc.contributor.authorTu, King-Ningen_US
dc.contributor.authorChen, Chihen_US
dc.date.accessioned2020-05-05T00:02:17Z-
dc.date.available2020-05-05T00:02:17Z-
dc.date.issued2020-03-01en_US
dc.identifier.urihttp://dx.doi.org/10.3390/ma13051211en_US
dc.identifier.urihttp://hdl.handle.net/11536/154085-
dc.description.abstractTensile tests on two kinds of electroplated copper foils with twins before and after annealing were performed. One electroplating parameter results in a microstructure of <110>-oriented microtwinned Cu (mt-Cu), and the other is <111>-oriented nanotwinned Cu (nt-Cu). The latter shows higher thermal stability than the former after annealing. Though the toughness for the two as-plated foils are quite close, the toughness for the <111> oriented nt-Cu increased from 34 to 74 MJ/m(3) after annealing at 250 degrees C for 3 h. In comparison, the toughness of the <110>-oriented mt-Cu remained almost the same after annealing.en_US
dc.language.isoen_USen_US
dc.subjectnano-twinned Cuen_US
dc.subjecttoughnessen_US
dc.subjectthermal stabilityen_US
dc.subjectelectroplated Cuen_US
dc.titleTensile Properties and Thermal Stability of Unidirectionally < 111 >-Oriented Nanotwinned and < 110 >-Oriented Microtwinned Copperen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/ma13051211en_US
dc.identifier.journalMATERIALSen_US
dc.citation.volume13en_US
dc.citation.issue5en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department國際半導體學院zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentInternational College of Semiconductor Technologyen_US
dc.identifier.wosnumberWOS:000524060200189en_US
dc.citation.woscount0en_US
顯示於類別:期刊論文