完整後設資料紀錄
DC 欄位語言
dc.contributor.authorLin, Shu-Yuen_US
dc.contributor.authorChou, Sheng-Lungen_US
dc.contributor.authorLin, Meng-Yehen_US
dc.contributor.authorHuang, Wen-Jianen_US
dc.contributor.authorHuang, Tzu-Pingen_US
dc.contributor.authorWu, Yu-Jongen_US
dc.date.accessioned2020-07-01T05:22:05Z-
dc.date.available2020-07-01T05:22:05Z-
dc.date.issued2020-05-29en_US
dc.identifier.issn0021-9606en_US
dc.identifier.urihttp://dx.doi.org/10.1063/5.0010293en_US
dc.identifier.urihttp://hdl.handle.net/11536/154502-
dc.description.abstractThe infrared (IR) spectrum of monobridged Si2H4 (denoted as mbr-Si2H4) isolated in solid Ar was recorded, and a set of lines (in the major matrix site) observed at 858.3 cm(-1), 971.5 cm(-1), 999.2 cm(-1), 1572.7 cm(-1), 2017.7 cm(-1), 2150.4 cm(-1), and 2158.4 cm(-1) were characterized. The species was produced by the electron bombardment of an Ar matrix sample containing a small proportion of SiH4 during matrix deposition. Upon photolysis of the matrix samples using 365 nm and 160 nm light, the content of mbr-Si2H4 increased. The band positions, relative intensity ratios, and D-isotopic shift ratios of the observed IR features are generally in good agreement with those predicted by the B3LYP/aug-cc-pVTZ method. In addition, the photochemistry of the observed products was discussed.en_US
dc.language.isoen_USen_US
dc.titleFormation and IR spectrum of monobridged Si2H4 isolated in solid argonen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/5.0010293en_US
dc.identifier.journalJOURNAL OF CHEMICAL PHYSICSen_US
dc.citation.volume152en_US
dc.citation.issue20en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000538140700001en_US
dc.citation.woscount0en_US
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