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dc.contributor.authorLin, Shih-Kaien_US
dc.contributor.authorWu, Cheng-Hsienen_US
dc.contributor.authorChen, Min-Chenen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLien, Chen-Hsinen_US
dc.contributor.authorXu, You-Linen_US
dc.contributor.authorTseng, Yi-Tingen_US
dc.contributor.authorWu, Pei-Yuen_US
dc.contributor.authorTan, Yung-Fangen_US
dc.contributor.authorSun, Li-Chuanen_US
dc.contributor.authorZhang, Yong-Cien_US
dc.contributor.authorHuang, Jen-Weien_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2020-10-05T02:01:07Z-
dc.date.available2020-10-05T02:01:07Z-
dc.date.issued2020-09-23en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttp://dx.doi.org/10.1088/1361-6463/ab92c5en_US
dc.identifier.urihttp://hdl.handle.net/11536/155163-
dc.description.abstractThis study examines the influence of different electrode thermal conductivity on switching behavior during the reset process. Electrical analysis methods and an analysis of current conduction mechanism indicate that better thermal conductivity in the electrode will require larger input power in order to induce more active oxygen ions to take part in the reset process. More active oxygen ions result in a more oxidized switching layer, and cause the effective switching gap (d(sw)) to become larger in the reset process. The effect of the electrode thermal conductivity and input power are explained by our model and clarified by electrical analysis methods.en_US
dc.language.isoen_USen_US
dc.subjectresistance random access memory (RRAM)en_US
dc.subjectreset behavioren_US
dc.subjectthermal conductivityen_US
dc.subjectoxygen ionsen_US
dc.subjectswitching regionen_US
dc.titleImpact of electrode thermal conductivity on high resistance state level in HfO2-based RRAMen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/1361-6463/ab92c5en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.citation.volume53en_US
dc.citation.issue39en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000551657000001en_US
dc.citation.woscount0en_US
Appears in Collections:Articles