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dc.contributor.authorLiu, Chienen_US
dc.contributor.authorChen, Hsuan-Hanen_US
dc.contributor.authorHsu, Chih-Chiehen_US
dc.contributor.authorFan, Chia-Chien_US
dc.contributor.authorHsu, Hsiao-Hsuanen_US
dc.contributor.authorCheng, Chun-Huen_US
dc.date.accessioned2020-10-05T02:01:30Z-
dc.date.available2020-10-05T02:01:30Z-
dc.date.issued2019-01-01en_US
dc.identifier.isbn978-4-86348-719-2; 978-4-86348-717-8en_US
dc.identifier.urihttp://hdl.handle.net/11536/155276-
dc.description.abstractWe demonstrated that the 2.5nm-thick HfAO(x) N-type NCFET based on defect-passivated multidomain switching can achieve a minimum 9 mV/dec subthreshold swing (SS), a negligible hysteresis of 1 mV, an ultralow I-off of 135 fA/mu m, a large I-on/I-off ratio of 8.7x 10(7) and a sub-60 mV/dec SS over 5 decade. For P-type NCFET, the non-hysteretic steep-slope switch is still reached under the synergistic effect of gate stress, defect passivation and doping engineering. The Al doping and defect passivation play the key role for reducing trap-related leakage, enhancing NC, and stabilizing multidomain switching. The highly scaled HfAlOx. CMOS NCFET shows the potential for low power logic applications.en_US
dc.language.isoen_USen_US
dc.titleNegative Capacitance CMOS Field-Effect Transistors with Non-Hysteretic Steep Sub-60mV/dec Swing and Defect-Passivated Multidomain Switchingen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2019 SYMPOSIUM ON VLSI TECHNOLOGYen_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000555822600024en_US
dc.citation.woscount0en_US
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