標題: | Growth mode transition of atomic layer deposited Al2O3 on porous TiO2 electrodes of dye-sensitized solar cells |
作者: | Tien, Ta-Chang Pan, Fu-Ming Wang, Lih-Ping Tsai, Feng-Yu Lin, Ching 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | Growth mode;Atomic layer deposition (ALD);Core/shell nanoparticle;Dye-sensitized solar cells |
公開日期: | 1-一月-2012 |
摘要: | This study investigates the growth behavior of atomic-layer-deposited (ALD) Al2O3 overlayers on porous TiO2 electrodes, which comprise an anatase nanoparticle layer and a rutile particle layer, for optimizing dye-sensitized solar cells. The growth mode of the AID Al2O3 overlayers changes from island growth to layer-by-layer growth during the first few MD reaction cycles, and the growth mode transition is much more pronounced for the anatase electrode layer. The transition is likely a result of the reduction in the contractive lattice strain of the TiO2 nanoparticles. The lattice strain in the hydroxylated TiO2 nanoparticles is progressively reduced during the ALD Al2O3 deposition, resulting in the growth mode transition. (c) 2011 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.tsf.2011.08.057 http://hdl.handle.net/11536/15689 |
ISSN: | 0040-6090 |
DOI: | 10.1016/j.tsf.2011.08.057 |
期刊: | THIN SOLID FILMS |
Volume: | 520 |
Issue: | 6 |
起始頁: | 1745 |
結束頁: | 1750 |
顯示於類別: | 期刊論文 |