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dc.contributor.authorJiang, Iris Hui-Ruen_US
dc.contributor.authorChang, Hua-Yuen_US
dc.contributor.authorChang, Chih-Longen_US
dc.date.accessioned2014-12-08T15:22:17Z-
dc.date.available2014-12-08T15:22:17Z-
dc.date.issued2012-04-01en_US
dc.identifier.issn1063-8210en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TVLSI.2011.2116049en_US
dc.identifier.urihttp://hdl.handle.net/11536/15775-
dc.description.abstractDue to excessive current densities, electromigration (EM) may trigger a permanent open- or short-circuit failure in signal wires or power networks in analog or mixed-signal circuits. As the feature size keeps shrinking, this effect becomes a key reliability concern. Hence, in this paper, we focus on wiring topology generation for avoiding EM at the routing stage. Prior works tended towards heuristics; on the contrary, we first claim this problem belongs to class P instead of class NP-hard. Our breakthrough is, via the proof of the greedy-choice property, we successfully model this problem on a multi-source multi-sink flow network and then solve it by a strongly polynomial time algorithm. Experimental results prove the effectiveness and efficiency of our algorithm.en_US
dc.language.isoen_USen_US
dc.subjectAlgorithmsen_US
dc.subjectelectromigration (EM)en_US
dc.subjectglobal routingen_US
dc.subjectintegrated circuit reliabilityen_US
dc.subjectlinear programmingen_US
dc.titleWiT: Optimal Wiring Topology for Electromigration Avoidanceen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TVLSI.2011.2116049en_US
dc.identifier.journalIEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMSen_US
dc.citation.volume20en_US
dc.citation.issue4en_US
dc.citation.spage581en_US
dc.citation.epage592en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000302085300001-
dc.citation.woscount3-
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