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dc.contributor.authorTasi, D. S.en_US
dc.contributor.authorKang, C. F.en_US
dc.contributor.authorWang, H. H.en_US
dc.contributor.authorLin, C. A.en_US
dc.contributor.authorKe, J. J.en_US
dc.contributor.authorChu, Y. H.en_US
dc.contributor.authorHe, J. H.en_US
dc.date.accessioned2014-12-08T15:22:19Z-
dc.date.available2014-12-08T15:22:19Z-
dc.date.issued2012-03-15en_US
dc.identifier.issn0146-9592en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OL.37.001112en_US
dc.identifier.urihttp://hdl.handle.net/11536/15801-
dc.description.abstractA visible-blind UV photodetector (PD) using a double heterojunction of n-ZnO/LaAlO3 (LAO)/p-Si was demonstrated. Inserted LAO layers exhibit electrical insulating properties and serve as blocking layers for photoexcited electrons from p-Si to n-ZnO, leading to an enhanced rectification ratio and a visible-blind UV detectivity of the n-ZnO/LAO/p-Si PDs due to the high potential barrier between LAO and p-Si layers (similar to 2.0 eV). These results support the use of n-ZnO/LAO/p-Si PDs in the visible-blind UV PDs in a visible-light environment. (C) 2012 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titlen-ZnO/LaAlO3/p-Si heterojunction for visible-blind UV detectionen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OL.37.001112en_US
dc.identifier.journalOPTICS LETTERSen_US
dc.citation.volume37en_US
dc.citation.issue6en_US
dc.citation.spage1112en_US
dc.citation.epage1114en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000302212200043-
dc.citation.woscount4-
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