完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wu, Yin-Hao | en_US |
dc.contributor.author | Yeh, Yen-Hsien | en_US |
dc.contributor.author | Chen, Kuei-Ming | en_US |
dc.contributor.author | Yang, Yu-Jen | en_US |
dc.contributor.author | Lee, Wei-I | en_US |
dc.date.accessioned | 2014-12-08T15:22:29Z | - |
dc.date.available | 2014-12-08T15:22:29Z | - |
dc.date.issued | 2012 | en_US |
dc.identifier.isbn | 978-0-8194-8905-0 | en_US |
dc.identifier.issn | 0277-786X | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/15893 | - |
dc.identifier.uri | http://dx.doi.org/82621Z | en_US |
dc.description.abstract | A-plane free-standing GaN was grown on a-plane GaN templates by HVPE. A-plane GaN templates were grown on r-plane sapphire by MOCVD with multilayer high-low-high temperature AlN buffer layers. A regrowth method was used for growing GaN through HVPE. First, GaN was grown on a-plane GaN templates, followed by separating the a-plane GaN film from r-plane sapphire using LLO. Then, the GaN films were regrown using HVPE. The resulting free-standing GaN contained some voids, which causes to release the stress. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Hydride vapor phase epitaxy | en_US |
dc.subject | non-polar Gallium Nitride | en_US |
dc.subject | Semiconducting III-V materials | en_US |
dc.title | Free-standing a-plane GaN substrates grown by HVPE | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.doi | 82621Z | en_US |
dc.identifier.journal | GALLIUM NITRIDE MATERIALS AND DEVICES VII | en_US |
dc.citation.volume | 8262 | en_US |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:000302556100040 | - |
顯示於類別: | 會議論文 |