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dc.contributor.authorWu, Yin-Haoen_US
dc.contributor.authorYeh, Yen-Hsienen_US
dc.contributor.authorChen, Kuei-Mingen_US
dc.contributor.authorYang, Yu-Jenen_US
dc.contributor.authorLee, Wei-Ien_US
dc.date.accessioned2014-12-08T15:22:29Z-
dc.date.available2014-12-08T15:22:29Z-
dc.date.issued2012en_US
dc.identifier.isbn978-0-8194-8905-0en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/15893-
dc.identifier.urihttp://dx.doi.org/82621Zen_US
dc.description.abstractA-plane free-standing GaN was grown on a-plane GaN templates by HVPE. A-plane GaN templates were grown on r-plane sapphire by MOCVD with multilayer high-low-high temperature AlN buffer layers. A regrowth method was used for growing GaN through HVPE. First, GaN was grown on a-plane GaN templates, followed by separating the a-plane GaN film from r-plane sapphire using LLO. Then, the GaN films were regrown using HVPE. The resulting free-standing GaN contained some voids, which causes to release the stress.en_US
dc.language.isoen_USen_US
dc.subjectHydride vapor phase epitaxyen_US
dc.subjectnon-polar Gallium Nitrideen_US
dc.subjectSemiconducting III-V materialsen_US
dc.titleFree-standing a-plane GaN substrates grown by HVPEen_US
dc.typeProceedings Paperen_US
dc.identifier.doi82621Zen_US
dc.identifier.journalGALLIUM NITRIDE MATERIALS AND DEVICES VIIen_US
dc.citation.volume8262en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000302556100040-
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