Thermomigration of Ti in flip-chip solder joints

標題:	Thermomigration of Ti in flip-chip solder joints
作者:	Chen, Hsiao-Yun Lin, Han-Wen Liu, Chien-Min Chang, Yuan-Wei Huang, Annie T. Chen, Chih 材料科學與工程學系 Department of Materials Science and Engineering
關鍵字:	Diffusion;Intermetallic compounds;Soldering;Titanium
公開日期:	1-May-2012
摘要:	Titanium has a very large heat of transport value of -768 kJ mol(-1). However, thermomigration of Ti in solder joints has not been examined. In this study, void formation was observed in non-current-stressed Al traces during electromigration and thermomigration tests of SnAg solder joints. Voids formed inside the traces located above the solder bumps with no current flow. We found that Ti thermomigration occurred in the joint, resulting in the reaction of Al and Cu, leaving voids behind in the Al trace. (C) 2012 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
URI:	http://hdl.handle.net/11536/16015
ISSN:	1359-6462
期刊:	SCRIPTA MATERIALIA
Volume:	66
Issue:	9
結束頁:	694
Appears in Collections:	Articles

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