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dc.contributor.authorYu, Chang-Hungen_US
dc.contributor.authorWu, Yu-Shengen_US
dc.contributor.authorHu, Vita Pi-Hoen_US
dc.contributor.authorSu, Pinen_US
dc.date.accessioned2014-12-08T15:23:32Z-
dc.date.available2014-12-08T15:23:32Z-
dc.date.issued2012-07-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://hdl.handle.net/11536/16459-
dc.description.abstractThis paper investigates the impact of quantum confinement (QC) on the backgate-bias (V-bg) modulated subthreshold and threshold-voltage (V-th) characteristics of ultra-thin-body germanium-on-insulator (UTB GeOI) MOSFETs using an analytical solution of the Schrodinger equation verified with TCAD numerical simulation. Our study indicates that the QC effect reduces the sensitivity of the subthreshold swing to V-bg. In addition, the sensitivity of V-th to V-bg can be enhanced by the QC effect particularly for electrostatically well-behaved UTB MOSFETs with triangular potential well. Aside from that, the sensitivity of V-th roll-off to V-bg is reduced by the QC effect. Since Ge and Si channels exhibit different degrees of QC due to different quantization effective mass, the impact of QC has to be considered when one-to-one comparisons between GeOI and SOI MOSFETs regarding the backgate-bias modulated threshold-voltage and subthreshold characteristics are made. Our study may provide insights for multi-V-th device/circuit designs using advanced UTB GeOI technologies.en_US
dc.language.isoen_USen_US
dc.subjectBackgate biasen_US
dc.subjectgermanium-on-insulator (GeOI)en_US
dc.subjectquantum confinement (QC)en_US
dc.subjectultra-thin body (UTB)en_US
dc.titleImpact of Quantum Confinement on Backgate-Bias Modulated Threshold-Voltage and Subthreshold Characteristics for Ultra-Thin-Body GeOI MOSFETsen_US
dc.typeArticleen_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume59en_US
dc.citation.issue7en_US
dc.citation.epage1851en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000305622800005-
dc.citation.woscount2-
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