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dc.contributor.authorChen, Wen-Yien_US
dc.contributor.authorKer, Ming-Douen_US
dc.date.accessioned2014-12-08T15:23:38Z-
dc.date.available2014-12-08T15:23:38Z-
dc.date.issued2012-06-01en_US
dc.identifier.issn1530-4388en_US
dc.identifier.urihttp://hdl.handle.net/11536/16523-
dc.description.abstractSafe operating area (SOA) in power semiconductors is one of the most important factors affecting device reliability. The SOA region of power MOSFETs must be well characterized for using in circuit design to meet the specification of applications, particularly including the time domain of circuit operations. In this paper, the characterization of SOA in the time domain is performed with the experimental measurement on silicon devices, and the useful techniques to improve SOA of power MOSFETs for using in high-voltage integrated circuits are overviewed.en_US
dc.language.isoen_USen_US
dc.subjectElectrical safe operating area (SOA) (eSOA)en_US
dc.subjectpower MOSFETsen_US
dc.subjectSOAen_US
dc.subjectsnapbacken_US
dc.subjectthermal SOA (tSOA)en_US
dc.titleCharacterization of SOA in Time Domain and the Improvement Techniques for Using in High-Voltage Integrated Circuitsen_US
dc.typeArticleen_US
dc.identifier.journalIEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITYen_US
dc.citation.volume12en_US
dc.citation.issue2en_US
dc.citation.epage382en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000305085100026-
dc.citation.woscount6-
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