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dc.contributor.authorLin, T. N.en_US
dc.contributor.authorHuang, C. P.en_US
dc.contributor.authorShu, G. W.en_US
dc.contributor.authorShen, J. L.en_US
dc.contributor.authorHsiao, C. S.en_US
dc.contributor.authorChen, S. Y.en_US
dc.date.accessioned2014-12-08T15:24:04Z-
dc.date.available2014-12-08T15:24:04Z-
dc.date.issued2012-08-01en_US
dc.identifier.issn1862-6300en_US
dc.identifier.urihttp://hdl.handle.net/11536/16742-
dc.description.abstract"The effect of pulsed laser annealing (PLA) on the photoluminescence (PL) properties of ZnO nanorods was investigated. As the fluence of pulsed laser increases, the UV PL in ZnO nanorods shows a general increasing trend, except at a range of fluences from 10 to 70?mJ/cm2. It is found that the treatment with the PLA at the fluence of 70?mJ/cm2 leads to a larger improvement of crystalline properties than that with rapid thermal annealing (RTA). The relationship between PL intensity and fluence of pulsed lasers can be well explained by a combination of the deterioration in surface crystallinity and the increased donor densities after PLA."en_US
dc.language.isoen_USen_US
dc.subjectnanorodsen_US
dc.subjectpulsed laser annealingen_US
dc.subjectrapid thermal annealingen_US
dc.subjectZnOen_US
dc.titleInfluence of pulsed laser annealing on the optical properties of ZnO nanorodsen_US
dc.typeArticleen_US
dc.identifier.journalPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCEen_US
dc.citation.volume209en_US
dc.citation.issue8en_US
dc.citation.epage1461en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000307548600010-
dc.citation.woscount5-
Appears in Collections:Articles


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