Ultrafast photoinduced mechanical strain in epitaxial BiFeO3 thin films

doi:41902

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DC 欄位	值	語言
dc.contributor.author	Chen, L. Y.	en_US
dc.contributor.author	Yang, J. C.	en_US
dc.contributor.author	Luo, C. W.	en_US
dc.contributor.author	Laing, C. W.	en_US
dc.contributor.author	Wu, K. H.	en_US
dc.contributor.author	Lin, J-Y	en_US
dc.contributor.author	Uen, T. M.	en_US
dc.contributor.author	Juang, J. Y.	en_US
dc.contributor.author	Chu, Y. H.	en_US
dc.contributor.author	Kobayashi, T.	en_US
dc.date.accessioned	2014-12-08T15:24:05Z	-
dc.date.available	2014-12-08T15:24:05Z	-
dc.date.issued	1970-01-01	en_US
dc.identifier.issn	0003-6951	en_US
dc.identifier.uri	http://dx.doi.org/41902	en_US
dc.identifier.uri	http://hdl.handle.net/11536/16750	-
dc.description.abstract	We studied ultrafast dynamics and photoinduced mechanical strain of BiFeO3 thin films by dual-color transient reflectivity measurements (Delta R/R). Anisotropic photostriction in BiFeO3 is found to be mainly driven by the optical rectification effect. Results of the photostriction at various thicknesses show that the estimated sound velocity along [110] direction of BiFeO3 is 4.76 km/s. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4734512]	en_US
dc.language.iso	en_US	en_US
dc.title	Ultrafast photoinduced mechanical strain in epitaxial BiFeO3 thin films	en_US
dc.type	Article	en_US
dc.identifier.doi	41902	en_US
dc.identifier.journal	APPLIED PHYSICS LETTERS	en_US
dc.citation.volume	101	en_US
dc.citation.issue	4	en_US
dc.citation.epage		en_US
dc.contributor.department	材料科學與工程學系	zh_TW
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	物理研究所	zh_TW
dc.contributor.department	Department of Materials Science and Engineering	en_US
dc.contributor.department	Department of Electrophysics	en_US
dc.contributor.department	Institute of Physics	en_US
dc.identifier.wosnumber	WOS:000306944700025	-
dc.citation.woscount	10	-
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