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dc.contributor.authorLin, Chun-Yuen_US
dc.contributor.authorChu, Li-Weien_US
dc.contributor.authorTsai, Shiang-Yuen_US
dc.contributor.authorKer, Ming-Douen_US
dc.date.accessioned2014-12-08T15:24:17Z-
dc.date.available2014-12-08T15:24:17Z-
dc.date.issued2012-09-01en_US
dc.identifier.issn1530-4388en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TDMR.2012.2188405en_US
dc.identifier.urihttp://hdl.handle.net/11536/16883-
dc.description.abstractNanoscale CMOS technologies have been widely used to implement radio-frequency (RF) integrated circuits. However, the thinner gate oxide and silicided drain/source in nanoscale CMOS technologies seriously degraded the electrostatic discharge (ESD) robustness of RF circuits. Against ESD damage, an on-chip ESD protection design must be included in the RF circuits. As the RF circuits operate in the higher frequency band, the parasitic effect from ESD protection circuit must be strictly limited. To provide the effective ESD protection for a 60-GHz low-noise amplifier with less RF performance degradation, two new ESD protection circuits were studied in a 65-nm CMOS process. Such compact ESD protection circuits have been successfully verified in silicon chip to achieve the 2-kV human-body-model ESD robustness with the low insertion loss in small layout area. With the better performances, the proposed ESD protection circuits were very suitable for V-band RF ESD protection.en_US
dc.language.isoen_USen_US
dc.subjectCMOSen_US
dc.subjectelectrostatic discharge (ESD) protectionen_US
dc.subjectradio frequency (RF)en_US
dc.subjectV-banden_US
dc.titleDesign of Compact ESD Protection Circuit for V-Band RF Applications in a 65-nm CMOS Technologyen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TDMR.2012.2188405en_US
dc.identifier.journalIEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITYen_US
dc.citation.volume12en_US
dc.citation.issue3en_US
dc.citation.spage554en_US
dc.citation.epage561en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000308461300003-
dc.citation.woscount0-
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